Edge-defined film-fed growth apparatus(EFG furnace)|Dai-ichi kiden, expert of high-frequency induction heating and hot press, induction heating apparatus

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Product

Edge-defined film-fed growth apparatus (EFG furnace)

Door chamber pulling system (CZ method)

Seed axis driven in XYΘ directions

Data logging capability

In-house developed crystal control software

 

High-frequency heating crystal grower

Description

This EFG growth equipment is designed for the cultivation of single crystals, which will become the semiconductor material of the future, with minimal power loss.

The equipment precisely implements the EFG growth method, allowing for versatile control of crystal shapes, such as plate, cylindrical, and prismatic forms.

By utilizing our in-house developed load cell in combination with a precisely controlled high-frequency power supply, ADC control is possible. Additionally, the seed axis is movable in XYΘ directions, allowing for fine adjustments.

Our in-house software enables customization according to customer needs and allows for the output of all relevant data.

Feature

  • Capable of growing crystals in various shapes
  • Enables fast and efficient crystal growth
  • Easy to control via computer automation
  • Data logging capability
  • ADC control achievable with a combination of our in-house load cell and crystal control software
  • Manual adjustments of the seed axis in XYΘ directions

|   Crystal growth   |

Contact

Please feel free to contact us if you have any questions.

042-488-3312

Reception time 09:00~17:30

Contact us by e-mail

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